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Pulsed laser deposition of atomically flat La1-xSrxMnO3 thin films using a novel target geometry

Willmott, P.R. ; Herger, R. ; Falub, M.C. ; Patthey, L. ; Döbeli, M. ; Falub, C.V. ; Shi, M. ; Schneider, M.

In: Applied Physics A, 2004, vol. 79, no. 4-6, p. 1199-1201

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    Titre
    • Pulsed laser deposition of atomically flat La1-xSrxMnO3 thin films using a novel target geometry
    Auteur
    • Willmott, P.R.. Swiss Light Source, Paul Scherrer Institute, 5232, Villigen, Switzerland
    • Herger, R.. Swiss Light Source, Paul Scherrer Institute, 5232, Villigen, Switzerland
    • Falub, M.C.. Swiss Light Source, Paul Scherrer Institute, 5232, Villigen, Switzerland
    • Patthey, L.. Swiss Light Source, Paul Scherrer Institute, 5232, Villigen, Switzerland
    • Döbeli, M.. ETH Hönggerberg, Paul Scherrer Institute, 8093, Zürich, Switzerland
    • Falub, C.V.. Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, 5232, Villigen, Switzerland
    • Shi, M.. Swiss Light Source, Paul Scherrer Institute, 5232, Villigen, Switzerland
    • Schneider, M.. Laboratory for Neutron Scattering, Paul Scherrer Institute, 5232, Villigen, Switzerland
    Type de document
    • Postprint
    Langue
    • Anglais
    Publié dans
    • Applied Physics A, 2004, vol. 79, no. 4-6, p. 1199-1201. Springer Berlin Heidelberg; www.springer.de
    Autre version électronique
    Classification
    • Technologie, Sciences de l'ingénieur
    Identifiant OAI-PMH
    • oai:doc.rero.ch:312137
    Summary
    A new ablation target geometry is presented that was used to produce thin films of La1-xSrxMnO3 grown heteroepitaxially on SrTiO3 by pulsed reactive crossed-beam laser ablation. The films were grown in order to perform angle-resolved photoelectron spectroscopy, which demands that the surface be atomically flat. In situ and ex situ analysis shows that this condition was met, even after depositing to a thickness of over 100nm