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Faculté des sciences
Texte intégral
Interferometric fabrication of modulated submicrometer gratings in photoresist
Ehbets, Peter
;
Herzig, Hans-Peter
;
Nussbaum, Philippe
;
Blattner, Peter
;
Dändliker, René
In: Applied Optics, 1995, vol. 34, no. 14, p. 2540-2547
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Microengineering
University of Neuchâtel
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Title
Interferometric fabrication of modulated submicrometer gratings in photoresist
Author
Ehbets, Peter
. Institut de Microtechnique, Université de Neuchâtel, Switzerland
Herzig, Hans-Peter
. Institut de Microtechnique, Université de Neuchâtel, Switzerland
Nussbaum, Philippe
. Institut de Microtechnique, Université de Neuchâtel, Switzerland
Blattner, Peter
. Institut de Microtechnique, Université de Neuchâtel, Switzerland
Dändliker, René
. Institut de Microtechnique, Université de Neuchâtel, Switzerland
Document Type
Postprint
Publication Date
1995
Language
English
Published in
Applied Optics,
1995, vol. 34, no. 14, p. 2540-2547. Optical Society of America
Other Version
Published Version :
http://ao.osa.org/abstract.cfm?id=45389
Classification
Microengineering
Keywords
holography
;
photoresist
;
submicrometer gratings
;
diffractive optical elements
;
optical interconnects
OAI-PMH Identifier
oai:doc.rero.ch:20080213163818-JX
Submission No.
20080213163818-JX