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Lateral resolution in focused electron beam-induced deposition: scaling laws for pulsed and static exposure

Szkudlarek, Aleksandra ; Szmyt, Wojciech ; Kapusta, Czesław ; Utke, Ivo

In: Applied Physics A, 2014, vol. 117, no. 4, p. 1715-1726

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    Titel
    • Lateral resolution in focused electron beam-induced deposition: scaling laws for pulsed and static exposure
    Autor
    • Szkudlarek, Aleksandra. Laboratory for Mechanics of Materials and Nanostructures, Empa, Feuerwerkerstrasse 39, 3602, Thun, Switzerland
    • Szmyt, Wojciech. Department of Solid State Physics, Faculty of Physics and Applied Computer Science, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059, Kraków, Poland
    • Kapusta, Czesław. Department of Solid State Physics, Faculty of Physics and Applied Computer Science, AGH University of Science and Technology, al. A. Mickiewicza 30, 30-059, Kraków, Poland
    • Utke, Ivo. Laboratory for Mechanics of Materials and Nanostructures, Empa, Feuerwerkerstrasse 39, 3602, Thun, Switzerland
    Dokumententyp
    • Postprint
    Sprache
    • Englisch
    Veröffentlicht in
    • Applied Physics A, 2014, vol. 117, no. 4, p. 1715-1726. Springer Berlin Heidelberg
    Andere elektronische Ausgabe
    Klassifikation
    • Technik, Ingenieurwissenschaften
    OAI-PMH-ID
    • oai:doc.rero.ch:326609
    Summary
    In this work, we review the single-adsorbate time-dependent continuum model for focused electron beam-induced deposition (FEBID). The differential equation for the adsorption rate will be expressed by dimensionless parameters describing the contributions of adsorption, desorption, dissociation, and the surface diffusion of the precursor adsorbates. The contributions are individually presented in order to elucidate their influence during variations in the electron beam exposure time. The findings are condensed into three new scaling laws for pulsed exposure FEBID (or FEB-induced etching) relating the lateral resolution of deposits or etch pits to surface diffusion and electron beam exposure dwell time for a given adsorbate depletion state.