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Nanoimprint lithography and micro-embossing in LiGA technology: similarities and differences

Schift, Helmut

In: Microsystem Technologies, 2014, vol. 20, no. 10-11, p. 1773-1781

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    Titre
    • Nanoimprint lithography and micro-embossing in LiGA technology: similarities and differences
    Auteur
    • Schift, Helmut. Laboratory for Micro- and Nanotechnology (LMN), Paul Scherrer Institut (PSI), 5232, Villigen PSI, Switzerland
    Type de document
    • Postprint
    Langue
    • Inglese
    Publié dans
    • Microsystem Technologies, 2014, vol. 20, no. 10-11, p. 1773-1781. Springer Berlin Heidelberg
    Autre version électronique
    Classification
    • Electricité
    Identifiant OAI-PMH
    • oai:doc.rero.ch:326058
    Summary
    LiGA and NIL are both techniques with origination by lithography, using molding techniques for upscaling or even stamp copying. The main difference is the size range for which they were seen to have most of their applications. The technology toolboxes contain similar processes and concepts, but due to historical differences, NIL and LiGA were not seen as twins, but rather children from different families. LiGA, as the more mature microtechnology, has found its application in microfluidics, -optics and -mechanics. NIL has found its place in photonics and sub-wavelength gratings, and is considered as a candidate for patterned media and next generation lithography for IC manufacturing. In this review I will discuss similarities and differences of the two technologies, tackle questions from pattern transfer, size effects including the need for hard and soft elements for molding and discuss points where LiGA and NIL might find a common basis for further cross-fertilization and joint applications.