Fulltext

In-Situ TOF-SIMS and SFM Measurements Providing True 3D Chemical Characterization of Inorganic and Organic Nanostructures

Niehuis, Ewald ; Moellers, Rudolf ; Kollmer, Felix ; Arlinghaus, Henrik ; Bernard, Laetita ; Josef Hug, Hans ; Vranjkovic, Sasa ; Dianoux, Raphaelle ; Scheidemann, Adi

In: Microscopy and Microanalysis, 2014, vol. 20, no. S3, p. 2086-2087

Add to personal list
    Title
    • In-Situ TOF-SIMS and SFM Measurements Providing True 3D Chemical Characterization of Inorganic and Organic Nanostructures
    Author
    • Niehuis, Ewald. ION-TOF GmbH, Muenster, Germany
    • Moellers, Rudolf. ION-TOF GmbH, Muenster, Germany
    • Kollmer, Felix. ION-TOF GmbH, Muenster, Germany
    • Arlinghaus, Henrik. ION-TOF GmbH, Muenster, Germany
    • Bernard, Laetita. EMPA, Duebendorf, Switzerland
    • Josef Hug, Hans. EMPA, Duebendorf, Switzerland
    • Vranjkovic, Sasa. EMPA, Duebendorf, Switzerland
    • Dianoux, Raphaelle. Nanoscan AG, Duebendorf, Switzerland
    • Scheidemann, Adi. Nanoscan AG, Duebendorf, Switzerland
    Document Type
    • Postprint
    Language
    • English
    Published in
    • Microscopy and Microanalysis, 2014, vol. 20, no. S3, p. 2086-2087. Cambridge University Press
    Other Version
    OAI-PMH Identifier
    • oai:doc.rero.ch:299782