Université de Neuchâtel

Micro-optical elements with arbitrary surfaces

Schilling, Andreas ; Nussbaum, Philippe ; Philipoussis, Irene ; Herzig, Hans-Peter ; Rossi, Markus ; Kley, Ernst-Bernhard

In: Diffractive Optics and Micro-Optics (DOMO), 2000, p. 234-236

We present a comparison of three different technologies for the fabrication of micro-optical elements with arbitrary surfaces. We used direct laser writing, binary mask lithography incombination with reactive ion etching, and graytone lithography.

Université de Neuchâtel

Fabrication technologies for micro-optical elements with arbitrary surfaces

Schilling, Andreas ; Nussbaum, Philippe ; Philipoussis, Irene ; Herzig, Hans-Peter ; Stauffer, Laurent ; Rossi, Markus ; Kley, Ernst-Bernhard

In: Micromachining Technology for Micro-Optics (Proceedings of SPIE), 2000, vol. 4179, p. 65-72

We present a comparison of three different technologies for the fabrication of micro-optical elements with arbitrary surfaces. We used direct laser writing in photoresist, binary mask lithography in combination with reactive ion etching in fused silica, and High-Energy- Beam-Sensitive (HEBS) glass graytone lithography in photoresist. We analyzed the efficiencies and the deflection angles of...