Refine my results

Document type

Institution

Specific Collection

Language

Université de Neuchâtel

Rough ZnO layers by LP-CVD process and their effect in improving performances of amorphous and microcrystalline silicon solar cells

Faÿ Sylvie ; Feitknecht, L. ; Schlüchter, R. ; Kroll, U. ; Vallat-Sauvain, Evelyne ; Shah, Arvind

In: Solar Energy Materials and Solar Cells, 2006, vol. 90, no. 18-19, p. 2960-2967

Doped ZnO layers deposited by low-pressure chemical vapour deposition technique have been studied for their use as transparent contact layers for thin-film silicon solar cells. Surface roughness of these ZnO layers is related to their light-scattering capability; this is shown to be of prime importance to enhance the current generation in thin-film silicon solar cells. Surface roughness has...

Université de Neuchâtel

Intrinsic microcrystalline silicon (μc-Si:H) deposited by VHF-GD (very high frequency-glow discharge): a new material for photovoltaics and optoelectronics

Shah, Arvind ; Vallat-Sauvain, Evelyne ; Torres, P. ; Meier, Johannes ; Kroll, U. ; Hof, Ch. ; Droz, C. ; Goerlitzer, M. ; Wyrsch, Nicolas ; Vaněček, M.

In: Materials Science and Engineering B, 2000, vol. 69-70, p. 219-226

The development of μc-Si:H technology and the introduction of intrinsic μc-Si:H as photovotaically active material is retraced. Special emphasis is laid on the use of very high frequency glow discharge as a particularly propitious deposition method for μc-Si:H. Thereby, the use of a gas purifier to reduce oxygen content and obtain intrinsic layers with ‘midgap’ character is described....