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    Université de Neuchâtel

    Recent progress in micromorph solar cells

    Meier, Johannes ; Dubail, S. ; Cuperus, J. ; Kroll, U. ; Platz, R. ; Torres, Pedro ; Anna Selvan, J. A. ; Pernet, P. ; Beck, N. ; Pellaton Vaucher, N. ; Hof, Ch. ; Fischer, Diego ; Keppner, Herbert ; Shah, Arvind

    In: Journal of Non-Crystalline Solids, 1998, vol. 227-230, p. 1250-1256

    Recently, we have demonstrated that intrinsic hydrogenated microcrystalline silicon, as deposited by the very high frequency glow-discharge technique, can be used as the active layers of p–i–n solar cells. Our microcrystalline silicon represents a new form of thin film crystalline silicon that can be deposited (in contrast to any other approach found in literature) at substrate temperatures...

    Université de Neuchâtel

    The “Micromorph” cell: a new way to high-efficiency-low-temperature crystalline silicon thin-film cell manufacturing?

    Keppner, H. ; Kroll, U. ; Torres, P. ; Meier, J. ; Platz, R. ; Fischer, D. ; Beck, N. ; Dubail, S. ; Anna Selvan, J. A. ; Pellaton Vaucher, N. ; Goerlitzer, M. ; Ziegler, Y. ; Tscharner, R. ; Hof, Ch. ; Goetz, M. ; Pernet, P. ; Wyrsch, Nicolas ; Vuille, J. ; Cuperus, J. ; Shah, Arvind ; Pohl, J.

    In: AIP Conference Proceeding, 1997, vol. 394, no. 1, p. 271-281

    Hydrogenated microcrystalline Silicon (µc-Si:H) produced by the VHF-GD (Very High Frequency Glow Discharge) process can be considered to be a new base material for thin-film crystalline silicon solar cells. The most striking feature of such cells, in contrast to conventional amorphous silicon technology, is their stability under light-soaking. With respect to crystalline silicon technology,...