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Université de Neuchâtel

Intrinsic microcrystalline silicon (μc-Si:H) deposited by VHF-GD (very high frequency-glow discharge): a new material for photovoltaics and optoelectronics

Shah, Arvind ; Vallat-Sauvain, Evelyne ; Torres, P. ; Meier, Johannes ; Kroll, U. ; Hof, Ch. ; Droz, C. ; Goerlitzer, M. ; Wyrsch, Nicolas ; Vaněček, M.

In: Materials Science and Engineering B, 2000, vol. 69-70, p. 219-226

The development of μc-Si:H technology and the introduction of intrinsic μc-Si:H as photovotaically active material is retraced. Special emphasis is laid on the use of very high frequency glow discharge as a particularly propitious deposition method for μc-Si:H. Thereby, the use of a gas purifier to reduce oxygen content and obtain intrinsic layers with ‘midgap’ character is described....