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Université de Neuchâtel

Concept and Demonstration of Individual Probe Actuation in Two-Dimensional Parallel Atomic Force Microscope System

Akiyama, Terunobu ; Aeschimann, Laure ; Chantada, Laura ; de Rooij, Nicolaas F. ; Heinzelmann, Harry ; Herzig, Hans-Peter ; Manzardo, Omar ; Meister, André ; Polesel-Maris, Jérôme ; Pugin, Raphaël ; Staufer, Urs ; Vettiger, Peter

In: Japanese Journal of Applied Physics, 2007, vol. 46, no. 9B, p. 6458-6462

A concept of an array actuator that is used to control the tip–sample separation of cantilevers in a two-dimensional (2D) probe array scanning system is proposed in this article. The feasibility of the concept is demonstrated with a 10×10 array actuator with 500 µm xy-pitches. The array actuator is made by slicing a bulk piezoceramic block. The obtained maximum actuation of a single...

Université de Neuchâtel

Scanning near-field optical microscopy: transfer function and resolution limit

Blattner, P. ; Herzig, Hans-Peter ; Dändliker, René

In: Optics Communications, 1998, vol. 150, no. 4-6, p. 245-250

We present scanning near-field optical microscopy as an optical instrument characterized by a transfer function. This approach gives some theoretical guidelines for the design of near-field optical measurement systems. We emphasize that it is important to distinguish between the resolution for the optical field and the resolution for the object. In addition, to solve the general inverse...

Université de Neuchâtel

Scanning spot metrology for testing of photolithographic masks

Blattner, Peter ; Herzig, Hans-Peter ; Sohail, S. ; Naqvi, H.

In: Optical Engineering, 1995, vol. 34, no. 8, p. 2425

We investigated an optical method for characterizing submicrometer structures of photolithographic masks, enabling fast and non-destructive testing over large areas. The scanning spot metrology provides accurate information about edge locations of opaque structures on chrome masks. Algorithms for the extraction of edge locations from the detector signal are discussed and applied to the...

Université de Neuchâtel

Optical testing of fine grating structures

Blattner, Peter ; Herzig, Hans-Peter

In: Optical Inspection and Micromeasurements (Proceedings of SPIE), 1996, vol. 2782, no. 6, p. 628-634

The ability to measure the relief parameters and the absolute position accuracy of micrometer-sized structures is of obvious importance, not only to determine if the desired structure has been realized, but also to optimize the fabrication process. In this paper a simple characterization method is presented allowing fast and non-destructive testing of phase and amplitude gratings over large...

Université de Neuchâtel

Diffractive optics for compact space communication terminals

Blattner, Peter ; Herzig, Hans-Peter ; Weible, Kenneth J. ; Teijido, Juan M. ; Heimbeck, Hans-Joerg ; Langenbach, E. ; Rogers, J.

In: journal of mo, 1996, vol. 43, no. 7, p. 1473-1484

Free-space laser communication links with data rates between 10 and 500 Mbits s-1 are required to cover the large amount of communication needs between low-orbit satellites, geostationary satellites and ground stations. The objective of this paper is to demonstrate the potential of diffactive optical elements for the design of optical and optoelectronic systems for advanced laser...

Université de Neuchâtel

Rigorous diffraction theory applied to microlenses

Blattner, Peter ; Herzig, Hans-Peter

In: Journal of Modern Optics, 1998, vol. 45, no. 7, p. 1395-1403

In this paper, we discuss the behaviour of small cylindrical microlenses, arranged in one-dimensional arrays and as single elements. For this purpose, we apply a standard rigorous diffraction theory, commonly used for diffraction gratings. We investigate the coupling effect between the elements. It turns out that single elements behave like periodic elements if the spacing is chosen correctly....

Université de Neuchâtel

Diffractive structures for testing nano-meter technology

Blattner, Peter ; Naqvi, S. S. H. ; Herzig, Hans-Peter ; Ehbets, Peter

In: Microelectronic Engineering, 1995, vol. 27, no. 1-4, p. 543-546

We investigated two optical methods for characterizing submicron structures. Average errors of a few nanometers can be determined by the far-field diffraction metrology utilizing diffractive structures having enhanced sensitivity to fabrication errors. The scanning spot metrology is well suited for analyzing lithographic masks.

Université de Neuchâtel

Microsystems for Optical Imaging and Interconnects

Dändliker, René ; Herzig, Hans-Peter ; Völkel, Reinhard

In: Unconventional Optical Elements for Information Storage, Processing and Communications, 2000, vol. 2, no. 5, p. 89-97

We report on our activities in the design, fabrication, characterization and system integration of planar micro-optical elements. Microfabrication technologies like photolithography, resist processing and reactive ion etching (RIE) are used to manufacture arrays of refractive and diffractive micro-optical elements. Microlens arrays, gratings, beam shapers and beam-splitters have been fabricated,...

Université de Neuchâtel

Collection of transverse and longitudinal fields by means of apertureless nanoprobes with different metal coating characteristics

Descrovi, E. ; Vaccaro, L. ; Nakagawa, Wataru ; Aeschimann, L. ; Staufer, U. ; Herzig, Hans-Peter

In: Applied Physics Letters, 2004, vol. 85, no. 22, p. 5340-5342

The coupling and transmission of transverse and longitudinal fields into apertureless microfabricated near-field optical probes is investigated. Two kinds of probes with different metal coating roughness are considered. Transverse and longitudinal field distributions are obtained by focusing azimuthally and radially polarized beams produced by means of a liquid crystal plate. The focal plane is...