Faculté des sciences

Potential of VHF-plasmas for low-cost production of a-Si: H solar cells

Kroll, U. ; Shah, Arvind ; Keppner, Herbert ; Meier, Johannes ; Torres, Pedro ; Fischer, D.

In: Solar Energy Materials and Solar Cells, 1997, vol. 48, no. 1-4, p. 343-350

Compared to the use of the standard glow discharge technique the production of amorphous silicon solar cells by the very high frequency glow discharge (VHF-GD) bears yet additional cost reduction potentials: Using VHF-GD at excitation frequencies higher than 13.56 MHz, a more efficient dissociation of silane gas is obtained; thus, higher deposition rates are achieved; this reduces... Plus

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    Summary
    Compared to the use of the standard glow discharge technique the production of amorphous silicon solar cells by the very high frequency glow discharge (VHF-GD) bears yet additional cost reduction potentials:
    Using VHF-GD at excitation frequencies higher than 13.56 MHz, a more efficient dissociation of silane gas is obtained; thus, higher deposition rates are achieved; this reduces considerably the deposition time for intrinsic amorphous and microcrystalline silicon layers.
    Furthermore, by itself and even more so, in combination with argon dilution, VHF-GD technique improves silane utilisation and leads, thus, to further cost reduction.
    Finally, by combining the VHF-GD technique and the “micromorph” concept “real” tandem cells (i.e. a superposition of two cells with distinctly different band gaps) can be deposited at low temperatures without the use of expensive germane gas.