Faculté des sciences

Fast deposition of μc-Si:H by restrictive dilution and enhanced HF-power

Torres, P. ; Keppner, H. ; Meier, Johannes ; Kroll, U. ; Beck, N. ; Shah, A.

In: Physica status solidi. A. Applied research, 1997, vol. 163, no. 2, p. R9-R10

The purpose of this paper is to demonstrate that an enhanced deposition rate in excess of 10Å/s with reasonnable cell performances is however, indeed possible while remaining within the Very High Frequency-Glow Discharge (VHF-GD) deposition technique (at plasma excitation frequencies of 70 to 130MHz). More

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    Summary
    The purpose of this paper is to demonstrate that an enhanced deposition rate in excess of 10Å/s with reasonnable cell performances is however, indeed possible while remaining within the Very High Frequency-Glow Discharge (VHF-GD) deposition technique (at plasma excitation frequencies of 70 to 130MHz).