Faculté des sciences

Diffractive structures for testing nano-meter technology

Blattner, Peter ; Naqvi, S. S. H. ; Herzig, Hans-Peter ; Ehbets, Peter

In: Microelectronic Engineering, 1995, vol. 27, no. 1-4, p. 543-546

We investigated two optical methods for characterizing submicron structures. Average errors of a few nanometers can be determined by the far-field diffraction metrology utilizing diffractive structures having enhanced sensitivity to fabrication errors. The scanning spot metrology is well suited for analyzing lithographic masks. Mehr

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    Summary
    We investigated two optical methods for characterizing submicron structures. Average errors of a few nanometers can be determined by the far-field diffraction metrology utilizing diffractive structures having enhanced sensitivity to fabrication errors. The scanning spot metrology is well suited for analyzing lithographic masks.