Faculté des sciences
Texte intégral

Potential of dry etching for the fabrication of fused silica micro-optical elements

Nussbaum, Philippe ; Weible, Kenneth J. ; Rossi, Markus ; Herzig, Hans-Peter

In: Micromachine Technology for Diffractive and Holographic Optics (Proceedings of SPIE), 1999, vol. 3879, p. 63-70

We report on recent progress in the fabrication of fused silica micro-optical elements, such as blazed gratings, refractive microlenses and microprisms. The elements are first made in photoresist and then they are transferred into fused silica by reactive ion etching. High selectivity etching is needed to realize structures with a high aspect ratio. Results are shown using various metallic etch... Plus

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    Titre
    • Potential of dry etching for the fabrication of fused silica micro-optical elements
    Auteur
    • Nussbaum, Philippe. Institut de Microtechnique, Université de Neuchâtel, Switzerland
    • Weible, Kenneth J.. WeibleOptech, Université de Neuchâtel, Switzerland
    • Rossi, Markus. CSEM Centre Suisse d’Electronique et d’Electrotechnique, Zürich, Switzerland
    • Herzig, Hans-Peter. Institut de Microtechnique, Université de Neuchâtel, Switzerland
    Type de document
    • Postprint
    Date de publication
    • 1999
    Langue
    • Anglais
    Publié dans
    • Lee, Sing H.;Cox, J. Allen - Micromachine Technology for Diffractive and Holographic Optics (Proceedings of SPIE), 1999, vol. 3879, p. 63-70. International Society for Optical Engineering (SPIE)
    Autre version électronique
    Identifiant OAI-PMH
    • oai:doc.rero.ch:20071213175252-MG
    Numéro de soumission
    • 20071213175252-MG
    Summary
    We report on recent progress in the fabrication of fused silica micro-optical elements, such as blazed gratings, refractive microlenses and microprisms. The elements are first made in photoresist and then they are transferred into fused silica by reactive ion etching. High selectivity etching is needed to realize structures with a high aspect ratio. Results are shown using various metallic etch masks. The shaping of optimized profiles is also presented to generate microlenses which are aspheric, or which have a low numerical aperture.