Faculté des sciences

Fabrication technologies for micro-optical elements with arbitrary surfaces

Schilling, Andreas ; Nussbaum, Philippe ; Philipoussis, Irene ; Herzig, Hans-Peter ; Stauffer, Laurent ; Rossi, Markus ; Kley, Ernst-Bernhard

In: Micromachining Technology for Micro-Optics (Proceedings of SPIE), 2000, vol. 4179, p. 65-72

We present a comparison of three different technologies for the fabrication of micro-optical elements with arbitrary surfaces. We used direct laser writing in photoresist, binary mask lithography in combination with reactive ion etching in fused silica, and High-Energy- Beam-Sensitive (HEBS) glass graytone lithography in photoresist. We analyzed the efficiencies and the deflection angles of... More

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    Summary
    We present a comparison of three different technologies for the fabrication of micro-optical elements with arbitrary surfaces. We used direct laser writing in photoresist, binary mask lithography in combination with reactive ion etching in fused silica, and High-Energy- Beam-Sensitive (HEBS) glass graytone lithography in photoresist. We analyzed the efficiencies and the deflection angles of different elements in order to quantify the performance of the different technologies. We found that higher effencies can be achieved with refractive type elements, while precise deflection angles can be obtained more easily with diffractive elements.