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Direct imprinting of organic-inorganic hybrid materials into high aspect ratio sub-100nm structures

Cadarso, V. ; Kiefer, T. ; Auzelyte, V. ; Atasoy, H. ; Gruetzner, G. ; Brugger, J.

In: Microsystem Technologies, 2014, vol. 20, no. 10-11, p. 1961-1966

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    Titre
    • Direct imprinting of organic-inorganic hybrid materials into high aspect ratio sub-100nm structures
    Auteur
    • Cadarso, V.. Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015, Lausanne, Switzerland
    • Kiefer, T.. Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015, Lausanne, Switzerland
    • Auzelyte, V.. Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015, Lausanne, Switzerland
    • Atasoy, H.. Micro Resist Technology GmbH, Koepenickerstr. 325, 12555, Berlin, Germany
    • Gruetzner, G.. Micro Resist Technology GmbH, Koepenickerstr. 325, 12555, Berlin, Germany
    • Brugger, J.. Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015, Lausanne, Switzerland
    Type de document
    • Postprint
    Langue
    • Anglais
    Publié dans
    • Microsystem Technologies, 2014, vol. 20, no. 10-11, p. 1961-1966. Springer Berlin Heidelberg
    Autre version électronique
    Classification
    • Electricité
    Identifiant OAI-PMH
    • oai:doc.rero.ch:325619
    Summary
    The challenging fabrication of sub-100-nm structures with high aspect ratio by UV-nanoimprint lithography (NIL) is addressed in this work. Thermal shrinkage is induced by cooling the structures below room temperature to avoid the issues commonly arising during the release of the polymeric nanostructures from the master. The UV-NIL has been performed to obtain OrmoComp® nanostructures using OrmoStamp® working stamps copied from Si masters. Nanoridges and nanopillars with 45nm width and 380nm thickness have been fabricated with a corresponding aspect ratio of 8.5. This is, to the best of our knowledge, the highest aspect ratio achieved using organic-inorganic hybrid materials at the sub-100-nm scale.