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Aerosol emission monitoring in the production of silicon carbide nanoparticles by induction plasma synthesis

Thompson, Drew ; Leparoux, Marc ; Jaeggi, Christian ; Buha, Jelena ; Pui, David ; Wang, Jing

In: Journal of Nanoparticle Research, 2013, vol. 15, no. 12, p. 1-13

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    Titre
    • Aerosol emission monitoring in the production of silicon carbide nanoparticles by induction plasma synthesis
    Auteur
    • Thompson, Drew. Particle Technology Laboratory, University of Minnesota, 55455, Minneapolis, MN, USA
    • Leparoux, Marc. Laboratory for Advanced Materials Processing, Empa - Swiss Federal Laboratories for Materials Science and Technology, 3602, Thun, Switzerland
    • Jaeggi, Christian. Laboratory for Advanced Materials Processing, Empa - Swiss Federal Laboratories for Materials Science and Technology, 3602, Thun, Switzerland
    • Buha, Jelena. Laboratory for Analytical Chemistry, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600, Dubendorf, Switzerland
    • Pui, David. Particle Technology Laboratory, University of Minnesota, 55455, Minneapolis, MN, USA
    • Wang, Jing. Laboratory for Analytical Chemistry, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600, Dubendorf, Switzerland
    Type de document
    • Postprint
    Langue
    • Anglais
    Publié dans
    • Journal of Nanoparticle Research, 2013, vol. 15, no. 12, p. 1-13. Springer Netherlands
    Autre version électronique
    Identifiant OAI-PMH
    • oai:doc.rero.ch:313814
    Summary
    In this study, the synthesis of silicon carbide (SiC) nanoparticles in a prototype inductively coupled thermal plasma reactor and other supporting processes, such as the handling of precursor material, the collection of nanoparticles, and the cleaning of equipment, were monitored for particle emissions and potential worker exposure. The purpose of this study was to evaluate the effectiveness of engineering controls and best practice guidelines developed for the production and handling of nanoparticles, identify processes which result in a nanoparticle release, characterize these releases, and suggest possible administrative or engineering controls which may eliminate or control the exposure source. No particle release was detected during the synthesis and collection of SiC nanoparticles and the cleaning of the reactor. This was attributed to most of these processes occurring in closed systems operated at slight underpressure. Other tasks occurring in more open spaces, such as the disconnection of a filter assembly from the reactor system and the use of compressed air for the cleaning of filters where synthesized SiC nanoparticles were collected, resulted in releases of submicrometer particles with a mode size of ~170-180nm. Observation of filter samples under scanning electron microscope confirmed that the particles were agglomerates of SiC nanoparticles