Faculté des sciences

Electron attachment properties of c-C₄F₈O in different environments

Chachereau, A. ; Fedor, Juraj ; Janečková, Radmila ; Kočišek, J. ; Rabie, M. ; Franck, C. M.

In: Journal of Physics D: Applied Physics, 2016, vol. 49, no. 37, p. 375201

The electron attachment properties of octafluorotetrahydrofuran (c-C₄F₈O) are investigated using two complementary experimental setups. The attachment and ionization cross sections of c-C₄F₈O are measured using an electron beam experiment. The effective ionization rate coefficient, electron drift velocity and electron diffusion coefficient in c-C₄F₈O diluted to concentrations... Plus

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    Summary
    The electron attachment properties of octafluorotetrahydrofuran (c-C₄F₈O) are investigated using two complementary experimental setups. The attachment and ionization cross sections of c-C₄F₈O are measured using an electron beam experiment. The effective ionization rate coefficient, electron drift velocity and electron diffusion coefficient in c-C₄F₈O diluted to concentrations lower than 0.6% in the buffer gases N₂, CO₂ and Ar, are measured using a pulsed Townsend experiment. A kinetic model is proposed, which combines the results of the two experiments.