Faculté des sciences

Scope of VHF plasma deposition for thin-film silicon solar cells

Keppner, Herbert ; Kroll, U. ; Torres, Pedro ; Meier, Johannes ; Fischer, Diego ; Goetz, M. ; Tscharner, R. ; Shah, Arvind

In: Conference Record of the 25th IEEE Photovoltaic Specialists Conference, 1996, p. 669-672

The world-wide attempts in obtaining thin-film crystalline silicon are reviewed. Based on literature published so far, it appears that high-temperature manufacturing steps seem to be unavoidable for obtaining high conversion efficiencies of crystalline silicon based solar cells. High process temperatures are in contradiction for the use of low-cost substrates like e.g. glass or aluminium. Such... Plus

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    Summary
    The world-wide attempts in obtaining thin-film crystalline silicon are reviewed. Based on literature published so far, it appears that high-temperature manufacturing steps seem to be unavoidable for obtaining high conversion efficiencies of crystalline silicon based solar cells. High process temperatures are in contradiction for the use of low-cost substrates like e.g. glass or aluminium. Such substrates, however, are essential for obtaining low module manufacturing costs. The very high frequency glow discharge process (VHF-GD) could have the potential to overcome the temperature-efficiency contradiction.